1. Plasma Bioscience & Medicine

Plasma Mediated Nanomaterials Preparation and Biomedical Application of the Materials
Antony Ananth
Sungkyunkwan University, Korea
Bioscience Application for Non-Thermal Atmospheric Pressure Biocompatible Plasma (NBP)
Ihn Han
Kwangwoon University, Korea
Air Discharge over Water: Generation, Process, and PAW Reactivity
Dongping Liu
Dalian University of Technology, China
Plasma and Plant Hormone
Masaharu Shiratani
Kyushu University, Japan
Influence of Plasma Treatment on Various Plant Structures
Mujahid Zaka ul-Islam
Ruhr-University Bochum, Germany

2. Plasma Processing for Semiconductor and Display Devices

Needs of New Plasma Etching Technologies for the Next 10 Years' Chip Fabrication
Keynote Jong Chul Park
Samsung Electronics Co., Ltd., Korea
Open-Air Plasma-Enhanced Deposition of Titanium Oxide Thin Films
Roldolphe Mauchauffe
Jeonbuk National University, Korea

3. Plasma Processes for Nanomaterial Development

Plasma-Assisted Nanomaterials for Photoelectrochemical and Electrocatalytic Water Spltting Applications: Ab Initio Study
Heechae Choi
University of Cologne, Germany
Nanomaterials Synthesis Using Triple DC Thermal Plasma Jet System
Sooseok Choi
Jeju National University, Korea
Plasma-Catalytic Conversion of Air Pollutants: Investigation of Reaction Process and Synergy Mechanism
Ye Daiqi
South China University of Technology, China
Low-temperature Synthesis of Monolayer Graphene Using a Microwave-excited Blowing Plasma
Jaeho Kim
National Institue of Advanced Industrial Science and Technology, Japan
Plasma-modified Catalysts and Catalysis: Application to Greenhouse Gas Utilization
Tomohiro Nozaki
Tokyo Institute of Technology, Japan

4. Plasma Diagnostics and Process Monitoring Technology

Solutions to the Challenges of Quantitative Neutral Species Measurements in Process Plasmas
Jianping Zhao
Tomography-Based Optical Diagnostics for Real-Time Monitoring of Spatial Uniformity in Microelectronics Processing Plasmas
Wonho Choe
KAIST, Korea
Predictive Control of the Plasma Processes after Discontinuities in the OLED Display Mass Production Line Referring to the PI-VM Model
Seolhye Park
Samsung Display Co., Ltd, Korea

5. Plasma Sources and Technology

Non-Equilibrium in Plasma-Surface Interactions – Does this Occur at Atmospheric Pressure?
Keynote Mark Kushner
University of Michigan, USA
Electron Heating and the Magnetic Asymmetry Effect in Magnetized Capacitive Radio Frequency Discharges
Birk Berger
Ruhr-University Bochum, Germany
Hysteresis Physics in Inductively Coupled Plasmas
Hyo-Chang Lee
KRISS, Korea
A Comprehensive Understanding of Breakdown Process of a Capacitively Coupled RF Ar Discharge
Yong-Xin Liu
Dalian University of Technology, China
Resonance Phenomena in Radio-Frequency Plasma Sources: From Basic Physics to Technological Significance
Thomas Mussenbrock
Ruhr-University Bochum, Germany

6. Plasma Modeling and Simulation Techniques

Realistic Simulations of Low Pressure Capacitive Radio Frequency Plasmas Operated at Low Frequencies and High Voltage
Keynote Julian Schulze
Ruhr-University Bochum, Germany
Dynamical Behaviors of Two-dimensional Dusty Plasmas Modified by Periodic Substrates
Yan Feng
Soochow University, China
Numerical Modeling of Molecular Interactions between Plasma Species and Biological Membrane
Satoshi Uchida
Tokyo Metropolitan University, Japan
Role of Chemical Nonequilibrium in Dynamic Anode Attachment of A Transffered Arc
Haixing Wang
Beihang University, China
Modeling Study on Interactions of Reactive Species in Atmospheric Plasmas and Biological Molecules
Yuan-Tao Zhang
Shandong University, China
Investigation of Biased Inductively Coupled Plasma Discharges
Yuru Zhang
Dalian University of Technology, China
2D Particle in Cell Simulations of Geometrically Asymmetric Capacitive RF Plasmas Driven by Tailored Voltage Waveforms including Realistic Plasma-Surface Interactions
Li Wang
Ruhr-University Bochum, China

7. 2D Materials and Their Application to Nano/Micro Devices

Nanoplasmonic Microdevice Platforms for In Vitro Diagnostics
Jaebum Choo
Chung-Ang University, Korea
Plasma Etching: from CMOS Industry to Renewable Energy
Maxime Darnon
Université de Sherbrooke, Canada
Energy Applications of 2D TMD FETs and Diodes Fabricated Using Plasma Processes
Seongil Im
Yonsei University, Korea
Valley Magnetic Domain for the Valleytronic Current Processing
Jae Dong Lee
DGIST, Korea
Flexible Electrode Coated with MoS2 for the Highly Sensitive Detection of Endocrine Hormones
Minho Lee
Chung-Ang University, Korea
Recent Progress in Device Processes Using 2D Materials
Won Jong Yoo
Sungkyunkwan University, Korea

8. Flexible and Stretchable Displays & Sensors

MEMS-type Gas Sensor toward Ultra-high-detection in ppt Level
Shimanoe Kengo
Kyushu University, Japan
Fiber Based Wearable Electronics for Sensor Applications
Taeyoon Lee
Yonsei University, Korea
Printable Electronic Memories and Sensors
Andreas Ruediger
Universite du Quebec, Canada

9. Energy Related Devices

Na-ion and All-Solid-State Na Batteries
Keynote Li Lu
NUS, Singapore
WOx/c-Si Heterojunction Solar Cells - Key for High Efficiencies
Vinh-Ai Dao
Duy Tan University, Vietnam
All Solid-State Batteries – Rational Materials Design and Enhanced Performance
Ruediger-A. Eichel
RWTH Aachen University & Research Institute Juelich, Germany
Infrared Thermography and Surface Acoustic Wave Sensor for Energy System and Toxic Gas Monitoring
Joo-Hyung Kim
Inha University, Korea
Non-precious Metal-based Electrocatalysts for High-efficiency Anion Exchange Membrane Water Electrolyzer
Jooyoung Lee
Korea Institute of Materials Science, Korea

10. Functional Materials - Synthesis, Characterizations, and Application

Fog Collection Using Secondary Electrohydrodynamic-Induced Hybrid Structures
Dae Joon Kang
Sungkyunkwan University, Korea
Anodization for the Highest Speed Swiching Vertical Organic Thin Film Transistor
Kyung Geun Lim
KRISS, Korea
Functional Interfacial Materials for Efficient Photovoltaic Cells
Seokin Na
Jeonbuk National University, Korea
Mutliscale in Inorganic Materials Crystallization
Dongfeng Xue
CAS, China
High Temperature Hydrogen Gas Sensing Property of Morphology Controllable Nitride
Shu Yin
Tohoku University, Japan

As of January 15, 2021